| Application | Widely used in decorative glass, conductive glass, TFT-LCD, semiconductor electronics. |
| Composition | Cu |
| Molding process | Melting |
| Density | ≥8.9g/cm3 |
| Purity | 4N |
| Application | Widely used in optical glass, touch screen glass film, conductive glass, TFT-LCD, semiconductor electronics. |
| Composition | AI |
| Molding process | Extrusion |
| Density | ≥2.7g/cm3 |
| Purity | 5N |
| Application | Widely used in Low-E glass film, touch screen glass film, conductive glass, TFT-LCD, semiconductor electronics. |
| Composition | Nb2Ox |
| Molding process | Spraying |
| Density | ≥4.3g/cm3% |
| Purity | 3N5 |
Widely used in decorative glass, conductive glass, TFT-LCD, semiconductor electronics.
Widely used in optical glass, touch screen glass film, conductive glass, TFT-LCD, semiconductor electronics.
Widely used in Low-E glass film, touch screen glass film, conductive glass, TFT-LCD, semiconductor electronics.
